Thin Film Morphologies of Bulk-Gyroid Polystyrene-<i>block</i>-polydimethylsiloxane under Solvent Vapor Annealing

Abstract

Thin film morphologies of a 75.5 kg/mol polystyrene-block-polydimethylsiloxane (PS-b-PDMS) diblock copolymer subject to solvent vapor annealing are described. The PS-b-PDMS has a double-gyroid morphology in bulk, but as a thin film the morphology can form spheres, cylinders, perforated lamellae, or gyroids, depending on the film thickness, its commensurability with the microdomain period, and the ratio of toluene:heptane vapors used for the solvent annealing process. The morphologies are described by self-consistent field theory simulations. Thin film structures with excellent long-range order were produced, which are promising for nanopatterning applications.