Publication | Open Access
Atomically layer-by-layer diffusion of oxygen/hydrogen in highly epitaxial PrBaCo2O5.5+δ thin films
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Citations
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References
2015
Year
EngineeringOxidation ResistanceThin Film Process TechnologyChemistryOxidation CyclePrbco UndergoMolecular Beam EpitaxyEpitaxial GrowthThin Film ProcessingMaterials ScienceOxide HeterostructuresOxide ElectronicsElectrochemistryOxygen Reduction ReactionLayer-by-layer DiffusionResistance RSurface ScienceApplied PhysicsCondensed Matter PhysicsThin Films
Single-crystalline epitaxial thin films of PrBaCo2O5.5+δ (PrBCO) were prepared, and their resistance R(t) under a switching flow of oxidizing and reducing gases were measured as a function of the gas flow time t in the temperature range of 200–800 °C. During the oxidation cycle under O2, the PrBCO films exhibit fast oscillations in their dR(t)/dt vs. t plots, which reflect the oxidation processes, Co2+/Co3+ → Co3+ and Co3+ → Co3+/Co4+, that the Co atoms of PrBCO undergo. Each oscillation consists of two peaks, with larger and smaller peaks representing the oxygen/hydrogen diffusion through the (BaO)(CoO2)(PrO)(CoO2) layers of PrBCO via the oxygen-vacancy-exchange mechanism. This finding paves a significant avenue for cathode materials operating in low-temperature solid-oxide-fuel-cell devices and for chemical sensors with wide range of operating temperature.
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