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Ion-Implanted Screen-Printed n-Type Solar Cell With Tunnel Oxide Passivated Back Contact
25
Citations
12
References
2015
Year
Materials ScienceSurface CharacterizationElectrical EngineeringIon ImplantationEngineeringTunneling MicroscopyPhysicsSup XmlnsTunnel OxideSurface ScienceApplied PhysicsCondensed Matter PhysicsOxide ElectronicsSurface AnalysisSurface EngineeringBulk Silicon WaferPhotovoltaics
This paper shows the results and the limitations of a 21% N-Cz 239-cm <sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sup> screen-printed cell with blanket p <sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">+</sup> emitter and n <sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">+</sup> back surface field. In addition, we show the properties and impact of tunnel oxide capped with doped n <sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">+</sup> polysilicon and metal on the back side, which can overcome those limitations. Since both the doped n <sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">+</sup> layer and the metal contact are outside the bulk silicon wafer, the J <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">o</sub> is dramatically reduced, resulting in much higher V <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">oc</sub> . Process optimization has resulted in high iV <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">oc</sub> of 728 mV on symmetric structures. The unmetallized cell structure with Al <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sub> O <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">3</sub> /SiN passivated lightly doped p <sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">+</sup> emitter and a tunnel oxide/n <sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">+</sup> poly back also gave high iV <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">oc</sub> of 734 mV. The finished screen-printed 132-cm <sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sup> device gave a V <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">oc</sub> of 683 mV, J <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">sc</sub> of 39.4 mA/cm <sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sup> , FF of 77.6%, and an efficiency of 20.9%. Cell analysis show that implementation of a selective emitter can give higher efficiency.
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