IEEE Transactions on Nuclear Science · 2000 · 39 citations · 5 references
Electrical EngineeringEngineeringNuclear PhysicsPhysicsRadiation DetectionNanoelectronicsNatural SciencesApplied PhysicsNeutron SourceDetector PhysicFundamental DeviceThin FilmsMicroelectronicsNeutron ScatteringOptoelectronicsMm Diameter FilmSemiconductor DeviceIntrinsic Detection Efficiency
Semiconductor thermal neutron detection devices based on /sup 10/B-coated high-purity GaAs films were investigated. The fundamental device consisted of high-purity /spl nu/-type epitaxial GaAs films grown onto n-type GaAs substrates. Two blocking contact adaptations were applied to the high-purity /spl nu/-type GaAs regions: 2000 /spl Aring/ thick p+GaAs blocking contacts and 200 /spl Aring/ thick Schottky blocking contacts. The /spl nu/-type GaAs active layers ranged between 1 micron and 5 microns in thickness. The device sensitive areas were 3 mm/spl times/3 mm, each of which was coated with a 1.5 mm diameter film of 98% enriched high-purity /sup 10/B. The built-in potential of the blocking contact interface was sufficient to operate the devices, and no external voltage bias was necessary to operate the detectors. Preliminary calculations on intrinsic detection efficiency indicate values between 1.6% and 2.6%.
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High efficiency neutron sensitive amorphous silicon pixel detectors
A. Mireshghi, G. Cho, J. Drewery et al. · IEEE Transactions on Nuclear Science · 1994 · 57 citations · Full text
Neutron Detectors Made From Chemically Vapour Deposited Semiconductors
F. Foulon, P. Bergonzo, A. Brambilla et al. · MRS Proceedings · 1997 · 42 citations