The synthesis, characterization, and photoinitiated cationic polymerization of silicon‐containing epoxy resins

Abstract

Abstract The preparation of a variety of silicon‐containing epoxy monomers and oligomers is described and their reactivity in photoinitiated cationic polymerization examined. Monomers and oligomers having terminal cycloaliphatic epoxy groups were found to be especially reactive in cationic polymerization. These materials are attractive candidates for use in coatings, adhesives, and elastomers.