Reactive gas-controlled arc process

Abstract

A method to reduce macroparticles, increase the deposition rate, and improve the coating quality in the cathodic vacuum arc deposition process is suggested. This method is based on the creation of emission-active phases on the cathode surface, and changing the melting point of surface layers of the cathode material and its work function. TiN coatings with a surface roughness of about 0.02 /spl mu/m and microhardness H/sub V/ about 4000 were deposited (compared with 0.085 /spl mu/m Ra and 2900 H/sub V/ for the conventional process). The method was successfully employed for the deposition of smooth coatings of AlN, (Ti,Al)N, and other compounds.