Publication | Closed Access
Atomic-Scale Pathway of the Pyramid-to-Dome Transition during Ge Growth on Si(001)
112
Citations
20
References
2004
Year
High ResolutionEngineeringMorphological TransitionSilicon On InsulatorSemiconductor NanostructuresSteeper Dome FacetsTunneling MicroscopySiliceneMolecular Beam EpitaxyEpitaxial GrowthSurface ReconstructionMaterials SciencePhysicsDefect FormationAtomic-scale PathwayMicrostructurePyramid-to-dome TransitionSurface ScienceApplied PhysicsCondensed Matter PhysicsGe Growth
By high resolution scanning tunneling microscopy, we investigate the morphological transition from pyramid to dome islands during the growth of Ge on Si(001). We show that pyramids grow from top to bottom and that, from a critical size on, incomplete facets are formed. We demonstrate that the bunching of the steps delimiting these facets evolves into the steeper dome facets. Based on first principles and Tersoff-potential calculations, we develop a microscopic model for the onset of the morphological transition, able to reproduce closely the experimentally observed behavior.
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