Correlation of the D-Band Photoluminescence with Spatial Properties of Dislocations in Silicon

K. Weronek, Joerg Weber, A. Höpner, F. Ernst, R. Buchner, M. Stefaniak, H. Alexander

Materials science forum · 1992 · 18 citations · 0 references

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Abstract

The D-band recombination in silicon is found to be independent of impurities trapped at dislocations. Deliberate contamination of high purity silicon samples, containing dislocations, with copper or iron results in a drastic decrease of the D-band photoluminescence. After a reduction of the copper and iron concentration, the D-bands reappear and increase in intensity by two orders of magnitude. The intensities and polarizations of the D-band photoluminescence depend strongly on the direction of detection and on the structure of the dislocation. We correlate the Dsub1/Dsub2- recombination with the stacking fault between two Shockley partial dislocations.