Publication | Closed Access
High-Frequency Extraction of the Extrinsic Capacitances for GaN HEMT Technology
42
Citations
8
References
2011
Year
Wide-bandgap SemiconductorWide Gan HemtsElectrical EngineeringEngineeringRf SemiconductorNanoelectronicsElectronic EngineeringApplied PhysicsAluminum Gallium NitrideGan Power DeviceNovel Extraction MethodologyPower ElectronicsHigh-frequency ExtractionMicroelectronicsImpedance ParametersOptoelectronicsCategoryiii-v Semiconductor
A novel extraction methodology is proposed to distinguish between the extrinsic and intrinsic capacitances of wide GaN HEMTs. This approach is based on the experimental observation that the real parts of the impedance parameters of such devices increase at high-frequency. The mathematical analysis clearly shows that this so far uninvestigated behavior can be attributed to the extrinsic capacitances.
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