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Influence of pulsed substrate bias on the structure and properties of Ti–Al–N films deposited by cathodic vacuum arc

Materials ScienceMaterials EngineeringEngineeringCathodic Vacuum ArcSurface ScienceApplied PhysicsPulsed Substrate BiasTi–al–n FilmsVacuum DeviceThin Film Process TechnologyThin FilmsChemical Vapor DepositionThin Film Processing