Concentration and thermal release of hydrogen in amorphous silicon carbide films prepared by rf sputtering - Concepedia

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Concentration and thermal release of hydrogen in amorphous silicon carbide films prepared by rf sputtering

11

Citations

15

References

1997

Year

Yoshifumi Suzaki, Tomokazu Shikama, Syoji YOSHIOKA, Kazuki Yoshii, Kiyoshi Yasutake

Thin Solid Films

Materials EngineeringMaterials ScienceEngineeringNanoelectronicsApplied PhysicsThermal ReleaseSemiconductor Device FabricationHydrogenThin FilmsAmorphous SolidMicroelectronicsChemical Vapor DepositionRf SputteringCarbideThin Film Processing

References

	Year	Citations

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