Monolithic self‐sustaining nanographene sheet grown using plasma‐enhanced chemical vapor deposition

Abstract

Abstract We have fabricated carbon nanowalls (CNWs) composed of monolithic self‐sustaining nanographene sheets standing vertically on a Si substrate, using plasma‐enhanced chemical vapor deposition with a C 2 F 6 /H 2 mixture. The crystallinity, evaluated by Raman spectroscopy and synchrotron X‐ray surface diffraction, and the electrical properties of the CNWs were improved by introducing O 2 gas into the source gas mixture during the CNW growth process. The temperature dependence of the resistivity of the CNW films exhibited semiconductor behavior.