Publication | Closed Access
In situ study of stress relaxation mechanisms of pure Al thin films during isothermal annealing
40
Citations
8
References
2006
Year
Materials ScienceAluminium NitrideMaterial AnalysisEngineeringSitu StudySurface ScienceApplied PhysicsStress Relaxation MechanismsThin FilmsChemical Vapor DepositionThin Film ProcessingMicrostructure
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