Aluminum Nitride Thin Films on an LTCC Substrate

Abstract

Aluminum nitride thin films deposited on a low‐temperature co‐fired ceramics substrate by reactive magnetron sputtering were investigated with regard to their crystal orientation and microstructural characteristics. Strong c ‐axis orientations of AlN thin films were observed when either a higher deposition temperature or an RF bias was adopted. This orientation was believed to be responsible for the high thermal conductivity of 26 W/mK for the AlN films deposited at 700°C under 25‐W bias. Photoluminescence spectrum in the wavelength range of 350–650 nm was analyzed to prove the involvement of potential oxygen‐related defects in the thin films.