Synthesis of Organosilicon Film on Polycarbonate by Means of Low-Temperature Atmospheric-Pressure Plasma Jet

Abstract

<para xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> Plasma-polymerized organosilicon films are deposited at room temperature by a novel double-pipe-type atmospheric-pressure plasma jet (APPJ), using hexamethyldisilazane (HMDSN) as precursor and argon (Ar) as carrier gas. The surface properties of the resulted plasma films are investigated as a function of radio-frequency plasma power and position from the plasma nozzle. The atmospheric-pressure plasma-polymerized films have been analyzed by static contact angle measurement, a Fourier transform infrared spectrometer, a UV–vis spectrometer, and atomic force microscopy. The ultrathin APPJ-polymerized films have been studied and correlated to chemical composition and surface morphology. UV–vis spectra have demonstrated the optical transparency of the APPJ polymerized films. </para>