Publication | Closed Access
Kinetic and mechanistic study on the chemical vapor deposition of titanium dioxide thin films by in situ FT-IR using TTIP
86
Citations
20
References
2003
Year
Materials ScienceSitu Ft-irEngineeringSurface ScienceApplied PhysicsMechanistic StudyThin FilmsChemical DepositionChemical Vapor DepositionThin Film Processing
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