Journal of The Electrochemical Society · 1961 · 41 citations · 0 references
Natural SciencesChemistryMaterials SciencePhysical ChemistrySurface ChemistrySurface ScienceOxidation ReactionsSurface KineticsSurface OxidationSurface PhysicsSurface Reaction KineticsThin Film OxidationOxidation Front PropagationOxidation KineticsOxidation MechanismsOxide Growth KineticsOxygen Partial Pressure EffectsSurface Oxidation MechanismsThin Film Oxidation KineticsTin Oxides
By means of a vacuum microbalance, the rates of oxidation of pure tin have been determined over a temperature range of 150°–220°C, and for several different pressures of oxygen in the range of 10−3 mm to 500 mm Hg. For oxygen pressures of 1 mm and above, the oxidation appears to proceed with time in three stages: (a) initially, the rate is low, but it increases to a maximum; (b) it then decreases and follows a direct logarithmic relationship; and (c) finally, for long times and thick films, the rate becomes erratic, either increasing rapidly or leveling off. Below an oxygen pressure of 1 mm, the oxidation rate increases continuously with time, and the rate‐determining step in the kinetic process appears to be the dissociation of oxygen.