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Optical inhomogeneity and microstructure of ZrO_2 thin films prepared by ion-assisted deposition
48
Citations
18
References
1996
Year
Optical MaterialsEngineeringChemical DepositionOptical InhomogeneityIi-vi SemiconductorOptical PropertiesIndex InhomogeneityAr-ion-assisted DepositionPulsed Laser DepositionThin Film ProcessingMaterials ScienceMaterials EngineeringPhysicsOxide ElectronicsAr-ion MomentumIon-assisted DepositionZro_2 Thin FilmsSurface ScienceApplied PhysicsThin FilmsOptoelectronicsChemical Vapor Deposition
The index inhomogeneity and the microstructure of ZrO(2) films prepared by Ar-ion-assisted deposition are investigated. The results show that as the Ar-ion momentum transferred to the growing film increases, the average refractive index increases, the vacuum-to-air spectral shift becomes almost zero, the sign of relative inhomogeneity transits from negative to positive, and the void fraction of the top layer next to air becomes smaller than that of the bottom one. These optical properties result from the improved packing density and denser outer region next to air. The Ar-ion bombardment also induces the changes in microstructure of ZrO(2) films, such as the preferential (111) orientation of cubic phase, increase in compressive stress, and reduction of surface roughness.
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