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Low-energy sputtering yields of nickel as a function of ion mass-a reinvestigation
21
Citations
11
References
1979
Year
Chemical EngineeringNoble GasEngineeringIon ImplantationPhysicsAccelerator Mass SpectrometryTarget FabricationSurface ScienceApplied PhysicsIon Mass-a ReinvestigationAtomic PhysicsSputtering YieldCosmic RayIon BeamIon EmissionSputtering YieldsIon ProcessElectrochemistry
Abstract The sputtering yield of nickel for noble gas, O+- and Ni+-ion bombardment at normal incidence has been measured in the energy region from 150 eV to 3 keV. The measurements were performed with an isotope separator. The sputtering yields were determined from the integrated beam current and the mass loss of the target. At low energy the measured sputtering yields show a stronger dependence on projectile mass than found in older measurements.
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