Publication | Closed Access

Influence of film structure and composition on diffusion barrier performance of SiOx thin films deposited by PECVD

Materials ScienceFilm StructureDiffusion Barrier PerformanceEngineeringDiffusion ResistanceSurface ScienceApplied PhysicsSiox Thin FilmsElectronic PackagingThin FilmsChemical DepositionChemical Vapor DepositionThin Film ProcessingElectrical Insulation