Zero Thermal Expansion in (Al _{2 <i>x</i>} (HfMg) _{1− <i>x</i>} )(WO ₄ ) ₃

Abstract

Low‐thermal‐expansion materials in a wide temperature range are expected to be used in electronic devices, optical devices, and nanoscale devices. The authors have tried to fabricate a single‐phase zero‐thermal‐expansion material. A new single‐phase ceramic material, (Al 2 x (HfMg) 1− x )(WO 4 ) 3 , could be produced from a mixture of a negative‐thermal‐expansion material, (HfMg)(WO 4 ) 3 , and a positive‐thermal‐expansion material, Al 2 (WO 4 ) 3 . At x =0.15 this material shows nearly zero thermal expansion from room temperature to 800°C.