Reliability physics · 1985 · 17 citations · 0 references
EngineeringMaterials EngineeringMaterials ScienceElectronic MaterialsMicroelectronicsThin FilmsElectrical CharacterizationNoiseNoise In Electronic DevicesNoise In Semiconductor DevicesNoise TestingThin Film Electrical PropertiesElectrical Noise TestingElectromigrationElectromigration AnalysisElectronic NoiseNoise CharacterizationNoise Sources In Semiconductor Materials
Electrical noise measurements were made for Al thin films subject to electromigration. The results were related to resistance measurements and SEM observation of the films. It was concluded that 1/f noise measurements can be used as a sensitive tool for detecting electromigration and the magnitude of noise is closely related to the time to failure of the films.