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Electromigration and 1/f Noise of Aluminum Thin Films
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1985
Year
Materials ScienceMaterials EngineeringElectrical EngineeringElectromigration TechniqueEngineeringElectrical Noise MeasurementsApplied PhysicsAluminum Thin FilmsNoise MeasurementsNoiseThin FilmsElectronic PackagingMicroelectronicsInstrumentationAl Thin FilmsThin Film ProcessingElectrical Insulation
Electrical noise measurements were made for Al thin films subject to electromigration. The results were related to resistance measurements and SEM observation of the films. It was concluded that 1/f noise measurements can be used as a sensitive tool for detecting electromigration and the magnitude of noise is closely related to the time to failure of the films.