Reaktionen an Silicium‐Silicium‐Bindungen, 3. Ein neuer Weg zur Knüpfung von Si – Ge‐und Si – Sn‐Bindungen: Hexachlordisilan‐Spaltung von Organometallphosphanen und (Trichlorsilyl)phosphan‐Recycling

Abstract

Reactions at Silicon‐Silicon Bonds, 3 [1] . – A New Path to Si – Ge and Si – Sn Bonds: Hexachlorodisilane Cleavage of Organometalphosphanes and (Trichlorosilyl)phosphane Recycling Trimethyl(trichlorsilyl)germane and ‐stannane ( 4, 5 ) have been prepared through hexachlorodisilane cleavage by germyl‐and stannylphosphanes R 2 PMMe 3 ( 1, 2 , R i 1‐C 3 H 7 , t 1‐C 4 H 9 ; MGe, Sn). The (trichlorosilyl)phosphane byproduct R 2 PSiCl 3 ( 3 ) may be recycled by transmetalation and methylation steps to provide starting germylphosphane (MeGeCl 3 , 2 MeLi) and stannylphosphane (Me 3 SnCl, 3 MeLi).