Effects of dopants on tin emission in a helium microwave-induced plasma

Abstract

Tin is prone to form refractory oxides in a microwave-induced plasma environmet in the presence of oxygen. In order to minimise the formation and deposition processes, various dopants were evaluated. From these, sulphur hexafluoride (SF6) gave the best results. It minimised tin oxide deposition thus leading to a better sensitivity for tin. Analytical performances for the determination of organotin compounds are also given.