Effects of total CH4/Ar gas pressure on the structures and field electron emission properties of carbon nanomaterials grown by plasma-enhanced chemical vapor deposition - Concepedia

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Effects of total CH4/Ar gas pressure on the structures and field electron emission properties of carbon nanomaterials grown by plasma-enhanced chemical vapor deposition

12

Citations

37

References

2009

Year

Junlei Qi, Xin Wang, Weitao Zheng, Hongwei Tian, C. Liu, Yang Lü, Yujia Peng, Gang Cheng

Applied Surface Science

Materials ScienceChemical EngineeringEngineeringCarbon-based MaterialNanomaterialsCarbon NanomaterialsGas Discharge PlasmaChemical Vapor DepositionPlasma Processing

References

	Year	Citations

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