Carbon nanotubes deposition in glow barrier discharge enhanced catalytic CVD

Abstract

This study discusses the development of an atmospheric pressure glow discharge enhanced CVD system for the catalytic growth of carbon nanotubes (CNTs). He/H2/CH4 (900 : 100 : 0–20 scc min−1) gas mixture was processed in the barrier discharge reactor operated at 760 Torr. Ni-coated (20 nm) quartz substrate was used up to 600°C to achieve low temperature catalytic growth of CNTs. Special pretreatment of substrate using metal plating technique was employed for uniform growth; minimum requirements for CNTs growth were specified in terms of substrate temperature, H2/CH4 ratio and deposition time. SEM and TEM micrographs confirmed multi-wall CNTs with outside diameter and number density of 40–50 nm and 109–1010 cm−2, respectively. On the other hand, some of those CNTs included considerable wall defects associated with Ni particle aggregation. We also applied DBD enhanced catalytic CVD, but CNTs could not synthesized.