Publication | Open Access
Deposition of silicon nitride thin films by hot-wire CVD at 100 °C and 250 °C
29
Citations
8
References
2009
Year
Materials ScienceEngineeringSurface ScienceApplied PhysicsThin Film DevicesThin Film Process TechnologyThin FilmsChemical DepositionChemical Vapor DepositionThin Film ProcessingHot-wire CvdThin-film Technology
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