Deposition of silicon nitride thin films by hot-wire CVD at 100 °C and 250 °C

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Silicon nitride produced by catalytic chemical vapor deposition method

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Method for determining the optical constants of a thin film on a transparent substrate

Dorian Minkov · Journal of Physics D Applied Physics · 1989 · 68 citations

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Structural order in Si–N and Si–N–O films prepared by plasma assisted chemical vapor deposition process

R. C. Budhani, Shashi Prakash, H.J. Doerr et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1987 · 43 citations

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Industrial high-rate (∼5 nm/s) deposited silicon nitride yielding high-quality bulk and surface passivation under optimum anti-reflection coating conditions

Bram Hoex, A. Erven, R.C.M. Bosch et al. · Progress in Photovoltaics Research and Applications · 2005 · 43 citations · Full text

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