Generalized phase diffraction gratings with tailored intensity

Abstract

We report the generation of continuous phase masks designed to generate a set of target diffraction orders with defined relative intensity weights. We apply a previously reported analytic calculation that requires resolving a single equation with a set of parameters defining the target diffraction orders. Then the same phase map is extended to other phase patterns such as vortex generating/sensing gratings. Results are demonstrated experimentally with a parallel-aligned spatial light modulator.