Publication | Closed Access
Crosstalk Reduction in a Shallow-Etched Silicon Nanowire AWG
40
Citations
5
References
2008
Year
EngineeringOptoelectronic DevicesIntegrated CircuitsSilicon On InsulatorInterconnect (Integrated Circuits)Shallow-etched Silicon NanowireNanoelectronicsGuided-wave OpticPhotonic Integrated CircuitNanophotonicsPhotonicsElectrical EngineeringOptical InterconnectsPhysicsArrayed WaveguidesSemiconductor Device FabricationRandom Phase ErrorMicroelectronicsPhotonic DeviceApplied PhysicsNanofabricationCrosstalk ReductionOptoelectronics
<para xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> We introduced shallow-etched silicon nanowire into the arrayed waveguides to decrease the random phase error due to the core width fluctuation. A fairly improved crosstalk value of 18 dB was achieved in the fabricated arrayed-waveguide grating with the on-chip loss of 3 dB. </para>
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