Publication | Closed Access
Directed Self‐Assembly of Poly(2‐vinylpyridine)‐<i>b</i>‐polystyrene‐<i>b</i>‐poly(2‐vinylpyridine) Triblock Copolymer with Sub‐15 nm Spacing Line Patterns Using a Nanoimprinted Photoresist Template
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Citations
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References
2015
Year
EngineeringNanostructured PolymerPolymer NanocompositesChemistryPolymersPolymer MaterialPolymer TechnologyPolymer ProcessingCopper ChlorideDirected Self‐assemblyPhotopolymer NetworkPolymer ChemistryNanolithography MethodMaterials ScienceTriblock CopolymerMetallic NanowiresPlatinum-salt Infiltration3D PrintingBlock Co-polymersNanomaterialsNatural SciencesSelf-assemblyPolymer ScienceSpacing Line PatternsPolymer Self-assembly
Low molecular weight P2VP-b-PS-b-P2VP triblock copolymer (poly(2-vinlypyridine)-block-polystyrene-block-poly(2-vinylpyridine)] is doped with copper chloride and microphase separated into lamellar line patterns with ultrahigh area density. Salt-doped P2VP-b-PS-b-P2VP triblock copolymer is self-assembled on the top of the nanoimprinted photoresist template, and metallic nanowires with long-range ordering are prepared with platinum-salt infiltration and plasma etching.
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