Thermal deposition of TiS films from volatile Ti(SBut)4 - Concepedia

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Thermal deposition of TiS films from volatile Ti(SBut)4

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1988

Year

Manfred Bochmann, Ian Hawkins, L. M. Wilson

Journal of the Chemical Society Chemical Communications

Materials ScienceMaterials EngineeringEngineeringPhysicsPhysicochemical AnalysisNatural SciencesI. HawkinsApplied PhysicsTis FilmsL. M. WilsonM. BochmannChemistryMolecular ChemistryChemical DepositionChemical Vapor DepositionSpectra-structure CorrelationThin Film Processing

Abstract

M. Bochmann, I. Hawkins and L. M. Wilson, J. Chem. Soc., Chem. Commun., 1988, 344 DOI: 10.1039/C39880000344