Applied Optics · 1998 · 66 citations · 22 references
Natural SciencesMaterials EngineeringMaterials ScienceOptical MaterialsSemiconductor MaterialsThin FilmsOptical Properties Of SolidsOptical Thin FilmsSemiconductor SurfacesSemiconductor Thin FilmsThin Film Optical PropertiesThin-film MaterialsEnergy Resolution OptimizationMultilayer MaterialsPhase Shifting MechanismsRadiation Energy ResolutionSilicon WafersSoft X-ray OpticsSoft X-ray SpectroscopyX-ray Reflectivity
We have systematically investigated ultrathin Cr/Sc multilayers (nanolayers), using tunable soft-x-ray synchrotron radiation. The multilayers were optimized for use either in normal incidence or at 45 degrees at photon energies around the 2p-absorption edges of Sc (399 eV) and Cr (574 eV), respectively. They were sputter deposited on Si wafers or on thin Si(3)N(4)-membrane support structures for use in reflection and in transmission, respectively, as polarizing and phase-retarding elements in a polarimeter. The performance theoretically expected with respect to reflection/transmission and energy resolution has been confirmed experimentally: A value of 7% for the normal-incidence peak reflectance at 395 eV was measured as well as a pronounced minimum in transmission for certain incidence angles and energies below the respective absorption edges, indicating significant phase-shifting effects.
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Review of plane grating focusing for soft x-ray monochromators
H. Petersen, C. Jung, Ch. Hellwig et al. · Review of Scientific Instruments · 1995 · 163 citations
Natural Sciences, Astronomy, Physics +13
Schottky type photodiodes as detectors in the VUV and soft x-ray range
Michael Krumrey, E. Tegeler, J. Barth et al. · Applied Optics · 1988 · 105 citations