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A search for a thermal spike effect in sputtering. I. Temperature dependence of the yield at low-kev, heavy-ion bombardment
71
Citations
12
References
1982
Year
EngineeringTemperature DependenceIon Beam InstrumentationIon ImplantationHeavy Ion PhysicIon BeamInstrumentationIon EmissionThermal Spike EffectMaterials SciencePhysicsQuartz MicrobalanceCosmic RayAngular-differential Sputtering YieldMicrostructureNuclear AstrophysicsHeavy-ion BombardmentNatural SciencesSurface ScienceApplied PhysicsMaterials Characterization
Abstract The temperature dependence of the angular-differential sputtering yield of silver has been studied for low-keV, heavy ion bombardment in order to check whether thermal spikes contribute to sputtering in this energy regime. An oscillating quartz microbalance was used as detector for sputtered particles. The measurements reported in this work pertain to sputtering of polycrystalline samples bombarded by 8 keV Ar+ and Xe+ ions at incident angles of 0°-60° and temperatures of 25 to 775 °C. No pronounced increase of the yield with temperature was observed. It is therefore concluded that thermal spikes are either of no significance in this energy range for atomic projectiles or they cannot be affected by the temperature of the bulk lattice. A small (30%) enhancement of the yield was observed after prolonged bombardment at target temperatures higher than about 400°C; this can be associated with the changes in surface morphology observed.
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