Plasma‐Resistant Dense Yttrium Oxide Film Prepared by Aerosol Deposition Process

Abstract

Dense yttrium oxide film was prepared on a quartz substrate by the aerosol deposition process at the room temperature. The deposition rate was very high, 60 m/h. Thick film of 10 m was easily achievable on the quartz substrate. Transmission electron microscopy showed that the film was highly dense without voids and was composed of randomly oriented Y 2 O 3 crystallites of sizes smaller than 20 nm. The interface between the film layer and the quartz substrate was homogeneous. The film (2‐m thick) had a high transmittance (55–85%) in the wavelength region of 250‐800 nm. The mechanical properties of the film were very good. The adhesion force of the interface between the Y 2 O 3 layer and the quartz substrate was over 80 MPa. The Vickers hardness of the film was 7.7 GPa. The film also had an excellent plasma resistance in a gas mixture of CF 4 /O 2 . Outstanding results were noted in eroded depth, surface roughness, nanostructure, and transmittance change after plasma exposure of the film.