Publication | Closed Access
Novel hydrofluorocarbon polymers for use as pellicles in 157 nm semiconductor photolithography: fundamentals of transparency
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Citations
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References
2003
Year
Materials ScienceNovel Hydrofluorocarbon PolymersEngineeringElectron-beam LithographyBeam LithographyOrganic ElectronicsPolymer ScienceApplied PhysicsPhotopolymer NetworkChemistryNm Semiconductor PhotolithographyOptoelectronicsPolymer ChemistryNanolithography MethodPolymers
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