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ZnO Films with Very High Haze Value for Use as Front Transparent Conductive Oxide Films in Thin-Film Silicon Solar Cells
129
Citations
14
References
2010
Year
Optical MaterialsEngineeringZinc OxideOptoelectronic DevicesThin Film Process TechnologyPhotovoltaicsSemiconductorsHaze ValueZno FilmsThin Film ProcessingMaterials ScienceElectrical EngineeringSolar PowerOxide ElectronicsOxide SemiconductorsSemiconductor MaterialHydrogenated Microcrystalline SiliconApplied PhysicsThin FilmsSolar CellsChemical Vapor DepositionSolar Cell Materials
We successfully increased the haze value of zinc oxide (ZnO) films fabricated using metal–organic chemical vapor deposition (MOCVD) by conducting glass-substrate etching before film deposition. It was found that with increasing the glass treatment time, the surface morphology of ZnO films changed from conventional pyramid-like single texture to greater cauliflower-like multi texture. Further, the rms roughness and the haze value of the films increased remarkably. Using ZnO films with a high haze value as front transparent conductive oxide (TCO) films in hydrogenated microcrystalline silicon (µc-Si:H) solar cells, we improved the quantum efficiency of these cells particularly in the long-wavelength region.
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