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Power absorption characteristics of an inductively coupled plasma discharge
11
Citations
21
References
1999
Year
Electrical EngineeringEnergy HarvestingEngineeringVacuum ResistanceGlow DischargePower Absorption CharacteristicsAntennaResistance RApplied Plasma PhysicMagnetohydrodynamicsComputational ElectromagneticsGas Discharge PlasmaPlasma ApplicationPlasma DischargeElectrical InsulationElectromagnetic Compatibility
Power absorption characteristics of an inductively coupled discharge are investigated experimentally and compared with a two-dimensional inductive heating theory in a planar single turn antenna at high frequency (18 MHz) and low pressure (/spl les/50 mtorr) conditions. We measure the resistance R, which consists of vacuum resistance R/sub /spl nu// and the plasma resistance R/sub p/ for a given RF power of P= 1/2 I/sub c//sup 2/R, where I/sub c/ is the coil current. The vacuum resistance is determined to be 0.44 R in our case. The plasma resistance increases as the gas pressure increases in a pressure range of 2 to 50 mtorr. Also, it increases with power. In a high-pressure range near 50 mtorr, however, it has a nearly constant value of about 0.6 /spl Omega/.
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