Pattern Replication by Confined Dewetting

Abstract

The dewetting of a polymer film in a confined geometry was employed in a pattern-replication process. The instability of dewetting films is pinned by a structured confining surface, thereby replicating its topographic pattern. Depending on the surface energy of the confining surface, two different replication mechanisms were found, leading to a choice of either a negative or a positive replication mechanism of a patterned plate.