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High detectivity InGaN-GaN multiquantum well p-n junction photodiodes
70
Citations
14
References
2003
Year
SemiconductorsPhotonicsElectrical EngineeringElectronic DevicesP-n Junction PhotodiodesEngineeringPhotodetectorsWide-bandgap SemiconductorApplied PhysicsAluminum Gallium NitrideIngan-gan Multiquantum WellGan Power DeviceOptoelectronic DevicesSemi-transparent Ni-au ElectrodesOptoelectronicsCategoryiii-v SemiconductorCompound Semiconductor
InGaN-GaN multiquantum well (MQW) p-n junction photodiodes with semi-transparent Ni-Au electrodes were fabricated and characterized. It was found that the fabricated InGaN-GaN p-n junction photodiodes exhibit a 20-V breakdown voltage and a photocurrent to dark current contrast ratio of ∼10 <sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">5</sup> when a 0.4-V reverse bias was applied. The peak responsivity at 380 nm was 1.28 and 1.76 A/W with a 0.1- and 3-V applied reverse bias, respectively. Furthermore, an internal gain was found from our InGaN-GaN MQW p-n junction photodiodes possibly due to the long-lifetime of GaN based materials. Also, it was found that the low frequency noise of our photodiodes was dominated by the 1/f type noise. For a given bandwidth of 500 Hz, the corresponding noise equivalent power and normalized detectivity D/sup */ were found to be 6.34×10/sup -13/ W and 4.45×10/sup 11/ cm/spl middot/Hz/sup 0.5/ W/sup -1/, respectively.
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