Etched ion tracks in silicon oxide and silicon oxynitride as charge injection or extraction channels for novel electronic structures - Concepedia

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Etched ion tracks in silicon oxide and silicon oxynitride as charge injection or extraction channels for novel electronic structures

66

Citations

5

References

2004

Year

D. Fink, K. Hoppe, W.R. Fahrner, R.M. Papaléo, A.S. Berdinsky, Amita Chandra, A. Chemseddine, A. Zrineh, Abhijit Biswas, Franz Faupel,

Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms

Electrical EngineeringIon ImplantationEngineeringNanoelectronicsApplied PhysicsIon TracksExtraction ChannelsSilicon OxideSemiconductor Device FabricationIon EmissionSilicon On InsulatorMicroelectronicsSemiconductor Device

References

	Year	Citations

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