Publication | Open Access
Fabrication and electrical characteristics of high-performance ZnO nanorod field-effect transistors
387
Citations
21
References
2004
Year
Materials ScienceHigh-performance ZnoElectrical EngineeringElectronic DevicesZno NanorodsElectronic MaterialsEngineeringNanomaterialsNanotechnologyNanoelectronicsNanoscale SystemApplied PhysicsOxide ElectronicsNanorod SurfaceNanostructure SynthesisNanocomputingHigh-mobility Field-effect Transistors
We report on fabrication and electrical characteristics of high-mobility field-effect transistors (FETs) using ZnO nanorods. For FET fabrications, single-crystal ZnO nanorods were prepared using catalyst-free metalorganic vapor phase epitaxy. Although typical ZnO nanorod FETs exhibited good electrical characteristics, with a transconductance of ∼140nS and a mobility of 75cm2∕Vs, the device characteristics were significantly improved by coating a polyimide thin layer on the nanorod surface, exhibiting a large turn-ON/OFF ratio of 104–105, a high transconductance of 1.9μS, and high electron mobility above 1000cm2∕Vs. The role of the polymer coating in the enhancement of the devices is also discussed.
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