Publication | Closed Access
Preparation and properties of amorphous TiO2 thin films by plasma enhanced chemical vapor deposition
179
Citations
28
References
1994
Year
Materials ScienceEngineeringOxide ElectronicsApplied PhysicsAmorphous SolidThin FilmsChemical Vapor DepositionThin Film Processing
| Year | Citations | |
|---|---|---|
Page 1
Page 1