Pre-Treatment of Bean Seedlings with Choline Compounds Increases the Resistance of Photosynthetic Apparatus to UV-B Radiation and Elevated Temperatures

Abstract

Bean (Phaseolus vulgaris L. cv. Berbukskaya) seedlings were pre-treated with choline compounds, 19 mM 2-ethyltrimethylammonium chloride (Ch) or 1.6 mM 2-chloroethyltrimethylammonium chloride (CCh), during 24 h, then after 6 d the excised primary leaves were exposed to UV-B and high temperature stress. Chlorophyll (Chl) fluorescence, delayed light emission, accumulation of photosynthetic pigments, contents of thiobarbituric acid reactive substances, and activities of the active oxygen detoxifying enzymes (superoxide dismutase, ascorbate peroxidase, and glutathione reductase) were examined. Pre-treatment of plants with Ch or CCh enhanced the resistance of photosystem 2 (PS2) photochemistry to UV-B and heat injuries. The higher stress resistance can be explained by the increased activity of the detoxifying enzymes. The increased content of UV-B-absorbing pigments may also contribute to the enhanced resistance of choline-treated plants to UV-B radiation.