Photooxidation of polystyrene by O₂ and N₂O

Abstract

Abstract Strips of polystyrene held in a flowing O 2 or N 2 O atmosphere have been exposed to 240‐600 nm radiation. The extent of photooxidation has been followed by x‐ray photoelectron spectroscopy (XPS). Although N 2 O is a more reactive gas than O 2 , it produces a less oxidized polymer surface. This surprising observation can be correlated to the photochemistry occurring at the gas/polystyrene interface. © 1992 John Wiley & Sons, Inc.