Publication | Open Access
Lattice sites of implanted Fe in Si
27
Citations
37
References
2005
Year
EngineeringNuclear PhysicsNeutron ScatteringSilicon On InsulatorDefect ToleranceIon ImplantationAngular DistributionLattice SitesSi Single CrystalsMaterials ScienceMaterials EngineeringCrystalline DefectsPhysicsDefect FormationCrystallographySolid-state PhysicFerroelasticsExperimental Nuclear PhysicsNatural SciencesApplied PhysicsCondensed Matter PhysicsRadioactive Isotope
The angular distribution of ${\ensuremath{\beta}}^{\ensuremath{-}}$ particles emitted by the radioactive isotope $^{59}\mathrm{Fe}$ was monitored following implantation into Si single crystals at fluences from $1.4\ifmmode\times\else\texttimes\fi{}{10}^{12}\phantom{\rule{0.3em}{0ex}}{\mathrm{cm}}^{\ensuremath{-}2}\phantom{\rule{0.3em}{0ex}}\text{to}\phantom{\rule{0.3em}{0ex}}1\ifmmode\times\else\texttimes\fi{}{10}^{14}\phantom{\rule{0.3em}{0ex}}{\mathrm{cm}}^{\ensuremath{-}2}$. We identified Fe on three distinct sites: ideal substitutional, displaced substitutional and displaced tetrahedral interstitial. Whereas displaced substitutional Fe was dominating for annealing temperatures below $500\phantom{\rule{0.2em}{0ex}}\ifmmode^\circ\else\textdegree\fi{}\mathrm{C}$, annealing between $500--700\phantom{\rule{0.2em}{0ex}}\ifmmode^\circ\else\textdegree\fi{}\mathrm{C}$ caused the majority of Fe to occupy displaced tetrahedral interstitial sites. Ideal substitutional positions were increasingly populated following annealing at $800\phantom{\rule{0.2em}{0ex}}\ifmmode^\circ\else\textdegree\fi{}\mathrm{C}$ and above. A comparison of the emission channeling results to M\"ossbauer and electron paramagnetic resonance experiments is given.
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