Plasma processes in electron-beam controlled rare-gas halide lasers

W. L. Nighan

IEEE Journal of Quantum Electronics · 1978 · 38 citations · 39 references

Concepts

Abstract

This paper presents the results of an analysis of plasma properties in an electron-beam controlled KrF* laser discharge. In this study, special emphasis is placed on establishing the relationship among the numerous kinetic processes influencing the populations of excited species in the laser medium, important reactions controlling the coupled populations of rare-gas metastable states and higher excited states are discussed in detail, along with the resultant effect of these reactions on KrF* formation efficiency. It is shown that the rare-gas monohalide production efficiency is approximately 20 percent under typical conditions, and that no single reaction dominates either production or loss of KrF*. In addition, the very important role of halogen molecule dissociation is treated and the resultant effects of dissociation on the temporal variations of plasma properties and on plasma stability are analyzed.

References

39