Journal of The Electrochemical Society · 1979 · 131 citations · 0 references
Natural SciencesChemistryMaterials ScienceChemical KineticsReaction EngineeringThermal AnalysisChemical OxidationHigh-temperature OxidationOxidation ReactionsSurface OxidationThermodynamics Of CeramicsArrhenius EquationArrhenius KineticsIsothermal OxidationOxidation KineticsOxide Growth KineticsOxide Layer FormationOxide Layer GrowthRate Constants
The kinetics of oxidation of Zircaloy‐4 in steam were examined under isothermal conditions from 900° to 1500°C. Rate curves describing the growth of the reaction product layers, oxide‐ and oxygen‐stabilized alpha, were obtained at 50°C intervals under carefully defined and documented experimental conditions. The early stages of oxidation for temperatures above 1000°C were shown to be virtually ideally parabolic; below 1000°C, the growth of the oxide layer was nonparabolic. Statistical evaluations of the data in terms of the rate constants and their Arrhenius parameters established the high degree of self‐consistency of these measurements. The features of the experimental apparatus and techniques that were necessary to insure accurate measurements are discussed.