Spontaneous exfoliation and tailoring of MoS₂in mixed solvents

Abstract

Spontaneous exfoliation of MoS2 is achieved in H2O2-NMP mixed solvents with a yield of over 60 wt%, operated under mild conditions. H2O2-prompted sheet-tailoring effect induces a size evolution of MoS2 nanosheets from micro-scale to nano-scale. Furthermore, the concurrent dissolution also affords an approach to introduce structural defects in the nanosheets.