Nanoporous Thin Films from Self‐Assembled Metallo‐ Supramolecular Block Copolymers

Abstract

Nanoporous thin polymer films have been produced by a simple two-step approach using metallo-supramolecular block copolymers as the starting materials. The first step is the self-assembly of the copolymer, yielding cylindrical microdomains oriented normal to the substrate. The second step involves the opening of the metal–ligand complex located at the junction of the two blocks by redox chemistry to release the minor block and create the pores (see Figure).