Publication | Closed Access

Grain Boundary Location-Controlled Polt-Si Films for Tft Devices Obtained Via Novel Excimer Laser Process

Materials ScienceTft DevicesEngineeringPhysicsNanoelectronicsSilicon On InsulatorApplied PhysicsSemiconductor Device FabricationPulsed Laser DepositionMicroelectronicsOptoelectronicsThin Film Processing